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1

Activation of RAW264.7 macrophages by oxidized galectin-1

Yu Echigo, Hayato Sugiki, Yuya Koizumi, Shinya Hikitsuchi, Hiroko Inoue

Journal:

Immunology Letters

Year:

2010

Language:

english

File:

PDF, 365 KB

english, 2010

2

Effects of oxidized galectin-1 on inducible NO synthase expression by interferon-γ in RAW264.7

Yuya Koizumi, Hiroko Inoue, Yu Echigo

Journal:

Neuroscience Research

Year:

2011

Language:

english

File:

PDF, 113 KB

english, 2011

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Development of molecular resists based on Phenyl[4]calixarene for EBL

Takasuka, Masaaki, Allen, Robert D., Somervell, Mark H., Okada, Yu, Hayashi, Hiromi, Echigo, Masatoshi

Year:

2011

Language:

english

File:

PDF, 1.35 MB

english, 2011

4

Analysis of gene expression changes induced by oxidized galectin-1 in RAW 264.7

Echigo, Yu, horie, hidenori, inoue, hiroko

Journal:

Neuroscience Research

Year:

2009

Language:

english

File:

PDF, 80 KB

english, 2009

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists

Echigo, Masatoshi, Yamakawa, Masako, Ochiai, Yumi, Okada, Yu, Takasuka, Masaaki, Somervell, Mark H., Wallow, Thomas I.

Year:

2012

Language:

english

File:

PDF, 1.41 MB

english, 2012

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL

Echigo, Masatoshi, Yamakawa, Masako, Ochiai, Yumi, Okada, Yu, Makinoshima, Takashi, Takasuka, Masaaki, Somervell, Mark H.

Year:

2013

Language:

english

File:

PDF, 692 KB

english, 2013

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL

Wallow, Thomas I., Hohle, Christoph K., Sato, Takashi, Yamakawa, Masako, Ochiai, Yumi, Okada, Yu, Makinoshima, Takashi, Takasuka, Masaaki, Echigo, Masatoshi

Year:

2014

Language:

english

File:

PDF, 1.49 MB

english, 2014